EFFECT OF LASER POLISHING OF THE SKIN
Indications for use:
– Skin with signs of wilting
– fine and deep wrinkles
– Problem skin (comedones, postacne, oily seborrhea)
– Dull, uneven complexion, pigmentation
RENEWAL – SMOOTNESS – RESILIENCY
The Mask-Peeling, created using an innovative Swiss formula, contains highly active ANA-acids and ultra-soft exfoliating enzymes for deep and gentle exfoliation of dead cells and stimulating skin renewal and rejuvenation. Skin tone is lightened and leveled, unevenness and wrinkles are smoothed, production of own collagen and elastin improves, skin resiliency and elasticity increase, aging processes slow down. The skin becomes fresh, bright, smooth and smooth.
Strengthens effect of after-care products.
Can be used to prepare the skin for acid peelings.
Directions: apply a thin layer on cleansed skin for 10-15 min. Avoid eye area, rinse with water. Perhaps a slight tingling. If the tingling intensifies, wash off the mask, apply a soothing cream of this line. It is recommended to use 1-2 times a week.
Ingredients: Aqua (Water), Glycolic Acid, Ethylhexyl Stearate, Cetearyl Alcohol, Polysorbate-60, PEG-100 Stearate, Ceteareth-25, Sodium Hydroxide, Lactic Acid, Panthenol, Dimethicone, Glycerin, Citric Acid, Salicylic Acid, Xanthan Gum, Allantoin, Phenoxyethanol, Methylparaben, Ethylparaben, Propylparaben, Euphrasia Officinalis (Eyebright) Extract, Melissa Officinalis (Balm Mint) Leaf Extract, Magnolia Biondii (Magnolia) Bud/Flower Extract, Lecithin, Parfum (Fragrance), Sodium Magnesium Silicate, Benzyl Alcohol, Methylchloroisothiazolinone, Methylisothiazolinone, Papain, Carbomer, 1,2 Hexanediol, Caprylyl Glycol, Algin, Butylphenyl Methylpropional, Hexyl Cinnamal, Linalool